Electrodeposition of polycrystalline and amorphous silicon for photovoltaic applications. Final report, June 11, 1979-September 10, 1980

Silicon was electrodeposited on metal substrates using two markedly different conditions. Polycrystalline deposits were obtained from K/sub 2/SiF/sub 6/ dissolved in high temperature (> 700/sup 0/C) molten fluoride salts. The deposits produced at temperatures below 80/sup 0/C from organo- and hal...

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Bibliographic Details
Main Author: Rauh, R.D.
Language:unknown
Published: 2022
Subjects:
14 SOLAR ENERGY
SILICON
ELECTROPLATING
AMORPHOUS STATE
AUGER ELECTRON SPECTROSCOPY
CARBONIC ACID ESTERS
INFRARED SPECTRA
MOLTEN SALTS
POLYCRYSTALS
POTASSIUM FLUORIDES
PRECURSOR
SILICON FLUORIDES
SODIUM FLUORIDES
VOLTAMETRY
ALKALI METAL COMPOUNDS
CRYSTALS
DEPOSITION
ELECTRODEPOSITION
ELECTROLYSIS
ELECTRON SPECTROSCOPY
ELEMENTS
ESTERS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
LYSIS
ORGANIC COMPOUNDS
PLATING
POTASSIUM COMPOUNDS
SALTS
SEMIMETALS
SILICON COMPOUNDS
SODIUM COMPOUNDS
SPECTRA
SPECTROSCOPY
SURFACE COATING
Carbonic acid
Online Access:http://www.osti.gov/servlets/purl/6168977
https://www.osti.gov/biblio/6168977
https://doi.org/10.2172/6168977
Description
Summary:Silicon was electrodeposited on metal substrates using two markedly different conditions. Polycrystalline deposits were obtained from K/sub 2/SiF/sub 6/ dissolved in high temperature (> 700/sup 0/C) molten fluoride salts. The deposits produced at temperatures below 80/sup 0/C from organo- and halo-silanes as silicon precursors in propylene carbonate electrolytes had an amorphous structure. Because the technology of electroplating silicon is largely undeveloped, a major emphasis was given to the electrochemical characterization of the plating baths and the relationship between the deposition conditions and the resulting deposits. The results with FLINAK (LiF (46.5%), KF (42.0%) and NaF (11.5%)) and the binary mixture LiF (50%) : KF (50%) as the molten salts for Si deposition were comparable. Cyclic voltammetry (CV) using a three-electrode configuration was done on the melts before and after addition of the silicon precursor. The amorphous silicon was deposited from propylene carbonate which had been dried over alumina. The best supporting electrolytes were tetrabutylammonium perchlorate and tetrafluoroborate. The silicon precursors investigated were SiHCl/sub 3/, SiHBr/sub 3/, SiCl/sub 4/, (ClC/sub 3/H/sub 6/)SiCl/sub 3/, Si(OEt)/sub 4/ and (CH/sub 3/)/sub 3/SiCl. Information on the chemical composition of the films was obtained from IR and Auger spectroscopy.

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