Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition

Motivated by the use of tetrakis(dimethylamino)silane (TKDMAS) to produce silicon nitride-based deposits and its potential as a precursor for Focused Electron Beam Induced Deposition (FEBID), we have studied its reactivity towards low energy electrons in the gas phase and the composition of its depo...

Full description

Bibliographic Details
Published in:Physical Chemistry Chemical Physics
Main Authors: Shih, Po-Yuan, Tafrishi, Reza, Cipriani, Maicol, Hermanns, Christian Felix, Oster, Jens, Gölzhäuser, Armin, Edinger, Klaus, Ingólfsson, Oddur
Other Authors: Raunvísindadeild (HÍ), Faculty of Physical Sciences (UI), Verkfræði- og náttúruvísindasvið (HÍ), School of Engineering and Natural Sciences (UI), Háskóli Íslands, University of Iceland
Format: Article in Journal/Newspaper
Language:English
Published: Royal Society of Chemistry (RSC) 2022
Subjects:
Online Access:https://hdl.handle.net/20.500.11815/3283
id ftopinvisindi:oai:opinvisindi.is:20.500.11815/3283
record_format openpolar
spelling ftopinvisindi:oai:opinvisindi.is:20.500.11815/3283 2023-05-15T16:51:22+02:00 Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition Shih, Po-Yuan Tafrishi, Reza Cipriani, Maicol Hermanns, Christian Felix Oster, Jens Gölzhäuser, Armin Edinger, Klaus Ingólfsson, Oddur Raunvísindadeild (HÍ) Faculty of Physical Sciences (UI) Verkfræði- og náttúruvísindasvið (HÍ) School of Engineering and Natural Sciences (UI) Háskóli Íslands University of Iceland 2022-03-30 9564-9575 https://hdl.handle.net/20.500.11815/3283 en eng Royal Society of Chemistry (RSC) info:eu-repo/grantAgreement/EC/H2020/722149 Physical Chemistry Chemical Physics;24(16) Shih, Po-Yuan, Tafrishi, Reza, Cipriani, Maicol, Hermanns, Christian Felix, Oster, Jens, Gölzhäuser, Armin . Ingólfsson, Oddur (2022). Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition. Physical Chemistry Chemical Physics (PCCP) 24(16), 9564-9575 1463-9076 1463-9084 (eISSN) https://hdl.handle.net/20.500.11815/3283 Physical Chemistry Chemical Physics (PCCP) org/10.1039/D2CP00257D info:eu-repo/semantics/embargoedAccess Physical and Theoretical Chemistry Efnafræði info:eu-repo/semantics/article 2022 ftopinvisindi https://doi.org/20.500.11815/3283 https://doi.org/10.1039/D2CP00257D 2022-11-18T06:52:21Z Motivated by the use of tetrakis(dimethylamino)silane (TKDMAS) to produce silicon nitride-based deposits and its potential as a precursor for Focused Electron Beam Induced Deposition (FEBID), we have studied its reactivity towards low energy electrons in the gas phase and the composition of its deposits created by FEBID. While no negative ion formation was observed through dissociative electron attachment (DEA), significant fragmentation was observed in dissociative ionization (DI). Appearance energies (AEs) of fragments formed in DI were measured and are compared to the respective threshold energies calculated at the DFT and coupled cluster (CC) levels of theory. The average carbon and nitrogen loss per DI incident is calculated and compared to its deposit composition in FEBID. We find that hydrogen transfer reactions and new bond formations play a significant role in the DI of TKDMAS. Surprisingly, a significantly lower nitrogen content is observed in the deposits than is to be expected from the DI experiments. Furthermore, a post treatment protocol using water vapour during electron exposure was developed to remove the unwanted carbon content of FEBIDs created from TKDMAS. For comparison, these were also applied to FEBID deposits formed with tetraethyl orthosilicate (TEOS). In contrast, effective carbon removal was achieved in post treatment of TKDMAS. This approach only marginally affected the composition of deposits made with TEOS. The Icelandic Centre of Research (RANNIS), grant no. 13049305(1−3). MC acknowledges a doctoral grant from the University of Iceland Research Fund. Peer Reviewed Article in Journal/Newspaper Iceland Opin vísindi (Iceland) Physical Chemistry Chemical Physics 24 16 9564 9575
institution Open Polar
collection Opin vísindi (Iceland)
op_collection_id ftopinvisindi
language English
topic Physical and Theoretical Chemistry
Efnafræði
spellingShingle Physical and Theoretical Chemistry
Efnafræði
Shih, Po-Yuan
Tafrishi, Reza
Cipriani, Maicol
Hermanns, Christian Felix
Oster, Jens
Gölzhäuser, Armin
Edinger, Klaus
Ingólfsson, Oddur
Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition
topic_facet Physical and Theoretical Chemistry
Efnafræði
description Motivated by the use of tetrakis(dimethylamino)silane (TKDMAS) to produce silicon nitride-based deposits and its potential as a precursor for Focused Electron Beam Induced Deposition (FEBID), we have studied its reactivity towards low energy electrons in the gas phase and the composition of its deposits created by FEBID. While no negative ion formation was observed through dissociative electron attachment (DEA), significant fragmentation was observed in dissociative ionization (DI). Appearance energies (AEs) of fragments formed in DI were measured and are compared to the respective threshold energies calculated at the DFT and coupled cluster (CC) levels of theory. The average carbon and nitrogen loss per DI incident is calculated and compared to its deposit composition in FEBID. We find that hydrogen transfer reactions and new bond formations play a significant role in the DI of TKDMAS. Surprisingly, a significantly lower nitrogen content is observed in the deposits than is to be expected from the DI experiments. Furthermore, a post treatment protocol using water vapour during electron exposure was developed to remove the unwanted carbon content of FEBIDs created from TKDMAS. For comparison, these were also applied to FEBID deposits formed with tetraethyl orthosilicate (TEOS). In contrast, effective carbon removal was achieved in post treatment of TKDMAS. This approach only marginally affected the composition of deposits made with TEOS. The Icelandic Centre of Research (RANNIS), grant no. 13049305(1−3). MC acknowledges a doctoral grant from the University of Iceland Research Fund. Peer Reviewed
author2 Raunvísindadeild (HÍ)
Faculty of Physical Sciences (UI)
Verkfræði- og náttúruvísindasvið (HÍ)
School of Engineering and Natural Sciences (UI)
Háskóli Íslands
University of Iceland
format Article in Journal/Newspaper
author Shih, Po-Yuan
Tafrishi, Reza
Cipriani, Maicol
Hermanns, Christian Felix
Oster, Jens
Gölzhäuser, Armin
Edinger, Klaus
Ingólfsson, Oddur
author_facet Shih, Po-Yuan
Tafrishi, Reza
Cipriani, Maicol
Hermanns, Christian Felix
Oster, Jens
Gölzhäuser, Armin
Edinger, Klaus
Ingólfsson, Oddur
author_sort Shih, Po-Yuan
title Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition
title_short Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition
title_full Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition
title_fullStr Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition
title_full_unstemmed Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition
title_sort dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition
publisher Royal Society of Chemistry (RSC)
publishDate 2022
url https://hdl.handle.net/20.500.11815/3283
genre Iceland
genre_facet Iceland
op_relation info:eu-repo/grantAgreement/EC/H2020/722149
Physical Chemistry Chemical Physics;24(16)
Shih, Po-Yuan, Tafrishi, Reza, Cipriani, Maicol, Hermanns, Christian Felix, Oster, Jens, Gölzhäuser, Armin . Ingólfsson, Oddur (2022). Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition. Physical Chemistry Chemical Physics (PCCP) 24(16), 9564-9575
1463-9076
1463-9084 (eISSN)
https://hdl.handle.net/20.500.11815/3283
Physical Chemistry Chemical Physics (PCCP)
org/10.1039/D2CP00257D
op_rights info:eu-repo/semantics/embargoedAccess
op_doi https://doi.org/20.500.11815/3283
https://doi.org/10.1039/D2CP00257D
container_title Physical Chemistry Chemical Physics
container_volume 24
container_issue 16
container_start_page 9564
op_container_end_page 9575
_version_ 1766041480762228736