Measurement setup for High Power Impulse Magnetron Sputtering
Recently material physics group at Science Institute of University of Iceland has been using reactive sputtering to grow thin films used in various research projects at the institute. These films have been grown using dc sputtering which has been proven a very successful method. High power impulse m...
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Uppsala universitet, Signaler och System
2011
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ftuppsalauniv:oai:DiVA.org:uu-162988 2023-05-15T16:48:37+02:00 Measurement setup for High Power Impulse Magnetron Sputtering Sveinsson, Ólafur Björgvin 2011 application/pdf http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-162988 eng eng Uppsala universitet, Signaler och System http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-162988 info:eu-repo/semantics/openAccess measurement setup magnetron sputtering Student thesis info:eu-repo/semantics/bachelorThesis text 2011 ftuppsalauniv 2023-02-23T21:43:15Z Recently material physics group at Science Institute of University of Iceland has been using reactive sputtering to grow thin films used in various research projects at the institute. These films have been grown using dc sputtering which has been proven a very successful method. High power impulse magnetron sputtering or HiPIMS is an new pulsed power sputtering method where shorter but high power pulses are used to sputter over lower steady power. The project resulted in a functional system capable of growing thin films using HiPIMS. Thin films grown with high power pulses have a higher film density and other more preferable properties compared to films grown using direct current magnetron sputtering. Bachelor Thesis Iceland Uppsala University: Publications (DiVA) |
institution |
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Uppsala University: Publications (DiVA) |
op_collection_id |
ftuppsalauniv |
language |
English |
topic |
measurement setup magnetron sputtering |
spellingShingle |
measurement setup magnetron sputtering Sveinsson, Ólafur Björgvin Measurement setup for High Power Impulse Magnetron Sputtering |
topic_facet |
measurement setup magnetron sputtering |
description |
Recently material physics group at Science Institute of University of Iceland has been using reactive sputtering to grow thin films used in various research projects at the institute. These films have been grown using dc sputtering which has been proven a very successful method. High power impulse magnetron sputtering or HiPIMS is an new pulsed power sputtering method where shorter but high power pulses are used to sputter over lower steady power. The project resulted in a functional system capable of growing thin films using HiPIMS. Thin films grown with high power pulses have a higher film density and other more preferable properties compared to films grown using direct current magnetron sputtering. |
format |
Bachelor Thesis |
author |
Sveinsson, Ólafur Björgvin |
author_facet |
Sveinsson, Ólafur Björgvin |
author_sort |
Sveinsson, Ólafur Björgvin |
title |
Measurement setup for High Power Impulse Magnetron Sputtering |
title_short |
Measurement setup for High Power Impulse Magnetron Sputtering |
title_full |
Measurement setup for High Power Impulse Magnetron Sputtering |
title_fullStr |
Measurement setup for High Power Impulse Magnetron Sputtering |
title_full_unstemmed |
Measurement setup for High Power Impulse Magnetron Sputtering |
title_sort |
measurement setup for high power impulse magnetron sputtering |
publisher |
Uppsala universitet, Signaler och System |
publishDate |
2011 |
url |
http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-162988 |
genre |
Iceland |
genre_facet |
Iceland |
op_relation |
http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-162988 |
op_rights |
info:eu-repo/semantics/openAccess |
_version_ |
1766038704767369216 |