Electromagnetic Modeling in Near-Field Scanning Microwave Microscopy Highlighting Limitations in Spatial and Electrical Resolutions

• Published in: 2018 IEEE MTT-S International Conference on Numerical Electromagnetic and Multiphysics Modeling and Optimization (NEMO)
• Main Authors: Polovodov, Petr, Brillard, Charlene, Haenssler, Olaf, C, Boyaval, Christophe, Deresmes, D., Eliet, Sophie, Wang, Fei, Clement, Nicolas, Theron, Didier, Dambrine, Gilles, Haddadi, Kamel
• Other Authors: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Nano and Microsystems - IEMN (NAM6 - IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), Faculty of Civil and Environmental Engineering, Technion - Israel Institute of Technology Haifa, Nanostructures, nanoComponents & Molecules - IEMN (NCM - IEMN), Advanced NanOmeter DEvices - IEMN (ANODE - IEMN), Circuits Systèmes Applications des Micro-ondes - IEMN (CSAM - IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Institut TELECOM/TELECOM Lille1, Institut Mines-Télécom Paris (IMT)-Institut Mines-Télécom Paris (IMT), This work is supported by the French National Research Agency (ANR) under the EquipEx Excelsior (www.excelsior-ncc.eu) and the European Union’s Horizon 2020 research and innovation programme under grant agreement No 761036., European Project: 761036,H2020-NMBP-2017-two-stage,MMAMA(2017)
• Format: Conference Object
• Language: English
• Published: HAL CCSD 2018
• Subjects: near-field scanning microwave microscopy (NSMM); finite element method (FEM); electromagnetic modeling; vector network analyzer (VNA); scanning electron microscope (SEM); [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics; [SPI]Engineering Sciences [physics]; Iceland
• Online Access: https://hal.science/hal-02155769; https://hal.science/hal-02155769/document; https://hal.science/hal-02155769/file/neno_aug_2018.pdf; https://doi.org/10.1109/NEMO.2018.8503487

International audience Near-field scanning microwave microscopy (NSMM) is a scanning probe microscopy (SPM) technique that measures the local interaction of evanescent microwaves with a sample using a sharp tip probe. The traceability in NSMM is still challenging as the distribution of the electrical fields is affected by several parameters. In this effort, finite element method (FEM) based electromagnetic modeling methods are used to study the effects of the wavelength of operation and the humidity on the spatial and electrical resolutions respectively. From the simulated data, it is demonstrated that the lateral resolution is improved with increasing the frequency of operation. Furthermore, the existence and influence of a water meniscus is highlighted by fine comparison between simulated and measured data. To face these issues, an alternative near-field scanning millimeter-wave microscopy working in a controlled environment is proposed. Keywords-near-field scanning microwave microscopy (NSMM); finite element method (FEM); electromagnetic modeling; vector network analyzer (VNA); scanning electron microscope (SEM).