Gas temperature measuements by high-resolution TALIF

• Main Author: Booth, Jean-Paul
• Other Authors: Laboratoire de Physique des Plasmas (LPP), Université Paris-Sud - Paris 11 (UP11)-Observatoire de Paris, Université Paris Sciences et Lettres (PSL)-Université Paris Sciences et Lettres (PSL)-École polytechnique (X), Institut Polytechnique de Paris (IP Paris)-Institut Polytechnique de Paris (IP Paris)-Sorbonne Université (SU)-Université Paris-Saclay-Centre National de la Recherche Scientifique (CNRS)
• Format: Conference Object
• Language: English
• Published: HAL CCSD 2016
• Subjects: [PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph]; Iceland
• Online Access: https://hal.science/hal-02593694

International audience Two-photon Absorption Laser-Induced Fluorescence (TALIF) is a well-established technique to measure relative (and with appropriate calibration techniques, absolute) densities of atoms in plasmas and flames. The excitation line profiles can provide additional information, but this is usually overlooked due to the mediocre spectral resolution of commercial pulsed dye laser systems. We have investigated O-atom TALIF excitation line profiles using a house-built narrow line-width pulsed UV laser system, based on pulsed Ti:Sa ring laser seeded by a cw infrared diode laser. The observed Doppler profiles allow unambiguous measurement of gas temperature with high precision in O2 and CO2 DC glow discharges. Sub-Doppler measurements, performed by reflecting the laser beam back through excitation zone, allow the pressure-broadened line shapes to be observed, both in a pure O2 DC discharge (up to 10 Torr pressure) and in an atmospheric pressure RF plasma jet in He/O2. Pressure broadening coefficients of the 3p3PJ state of O were determined for O2 and He bath gases, and were found to be an order of magnitude bigger than that predicted from the measured quenching rate.