The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation

Pre-print (óritrýnt handrit) We demonstrate the effect of ionization flux fraction on the epitaxial growth of Cu film on Cu (111) substrate at room temperature. We compare thermal evaporation, dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) with fully neutral, 50 % i...

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Main Authors: Kateb, Movaffaq, Hajihosein, Hamid, Gudmundsson, Jon Tomas, Ingvarsson, Snorri
Other Authors: Raunvísindastofnun (HÍ), Science Institute (UI), Verkfræði- og náttúruvísindasvið (HÍ), School of Engineering and Natural Sciences (UI), Háskóli Íslands, University of Iceland
Format: Report
Language:English
Published: University of Iceland 2020
Subjects:
Online Access:https://hdl.handle.net/20.500.11815/1893
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spelling ftopinvisindi:oai:opinvisindi.is:20.500.11815/1893 2023-05-15T16:50:51+02:00 The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation Kateb, Movaffaq Hajihosein, Hamid Gudmundsson, Jon Tomas Ingvarsson, Snorri Raunvísindastofnun (HÍ) Science Institute (UI) Verkfræði- og náttúruvísindasvið (HÍ) School of Engineering and Natural Sciences (UI) Háskóli Íslands University of Iceland 2020 https://hdl.handle.net/20.500.11815/1893 en eng University of Iceland https://hdl.handle.net/20.500.11815/1893 info:eu-repo/semantics/openAccess HiPIMS Molecular Dynamic Ionization Flux Fraction Surface Roughness Adhesion Sameindafræði info:eu-repo/semantics/preprint 2020 ftopinvisindi https://doi.org/20.500.11815/1893 2022-11-18T06:51:57Z Pre-print (óritrýnt handrit) We demonstrate the effect of ionization flux fraction on the epitaxial growth of Cu film on Cu (111) substrate at room temperature. We compare thermal evaporation, dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) with fully neutral, 50 % ionized and 100 % ionized flux, respectively. It is shown that higher ionization flux fraction of the deposition flux leads to smoother surfaces by two ma-jor mechanisms i.e. decreasing clustering in the vapor phase and bi-collision of high energy ions at the film surface. The bi-collision event consists of local amorphization which fills the gaps between islands followed by crystallization due to secondary collisions. We found bi-collision events to be very important to prevent island growth to become dominant and increase the surface roughness. Regardless of the deposition method, epitaxial Cu thin films suffer from stacking fault areas (twin boundaries) in agreement with recent experi-mental results. In addition, HiPIMS deposition presents considerable interface mixing while it is negligible in thermal evaporation and dcMS deposition, those present less adhesion accordingly. This work was partially supported by the University of Iceland Research Funds for Doctoral students, the Icelandic Research Fund Grant Nos. 196141, 130029 and 120002023 and the Swedish Government Agency for Innovation Systems (VINNOVA) contract No. 2014-04876. Report Iceland Opin vísindi (Iceland)
institution Open Polar
collection Opin vísindi (Iceland)
op_collection_id ftopinvisindi
language English
topic HiPIMS
Molecular Dynamic
Ionization Flux Fraction
Surface Roughness
Adhesion
Sameindafræði
spellingShingle HiPIMS
Molecular Dynamic
Ionization Flux Fraction
Surface Roughness
Adhesion
Sameindafræði
Kateb, Movaffaq
Hajihosein, Hamid
Gudmundsson, Jon Tomas
Ingvarsson, Snorri
The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation
topic_facet HiPIMS
Molecular Dynamic
Ionization Flux Fraction
Surface Roughness
Adhesion
Sameindafræði
description Pre-print (óritrýnt handrit) We demonstrate the effect of ionization flux fraction on the epitaxial growth of Cu film on Cu (111) substrate at room temperature. We compare thermal evaporation, dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) with fully neutral, 50 % ionized and 100 % ionized flux, respectively. It is shown that higher ionization flux fraction of the deposition flux leads to smoother surfaces by two ma-jor mechanisms i.e. decreasing clustering in the vapor phase and bi-collision of high energy ions at the film surface. The bi-collision event consists of local amorphization which fills the gaps between islands followed by crystallization due to secondary collisions. We found bi-collision events to be very important to prevent island growth to become dominant and increase the surface roughness. Regardless of the deposition method, epitaxial Cu thin films suffer from stacking fault areas (twin boundaries) in agreement with recent experi-mental results. In addition, HiPIMS deposition presents considerable interface mixing while it is negligible in thermal evaporation and dcMS deposition, those present less adhesion accordingly. This work was partially supported by the University of Iceland Research Funds for Doctoral students, the Icelandic Research Fund Grant Nos. 196141, 130029 and 120002023 and the Swedish Government Agency for Innovation Systems (VINNOVA) contract No. 2014-04876.
author2 Raunvísindastofnun (HÍ)
Science Institute (UI)
Verkfræði- og náttúruvísindasvið (HÍ)
School of Engineering and Natural Sciences (UI)
Háskóli Íslands
University of Iceland
format Report
author Kateb, Movaffaq
Hajihosein, Hamid
Gudmundsson, Jon Tomas
Ingvarsson, Snorri
author_facet Kateb, Movaffaq
Hajihosein, Hamid
Gudmundsson, Jon Tomas
Ingvarsson, Snorri
author_sort Kateb, Movaffaq
title The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation
title_short The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation
title_full The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation
title_fullStr The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation
title_full_unstemmed The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation
title_sort importance of hipims ionization flux fraction on the film microstructure and surface roughness: a molecular dynamic simulation
publisher University of Iceland
publishDate 2020
url https://hdl.handle.net/20.500.11815/1893
genre Iceland
genre_facet Iceland
op_relation https://hdl.handle.net/20.500.11815/1893
op_rights info:eu-repo/semantics/openAccess
op_doi https://doi.org/20.500.11815/1893
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