Investigation of Co/Ag Discontinuous Multilayers Prepared by UHV Electron Beam Evaporation
Co/Ag multilayers with 20 bilayers with the composition, Ti(5 nm) [Co(1 nm)/Ag(4 nm)]20 Ti(5 nm), were deposited by electron beam evaporation in ultrahigh vacuum and annealed under vacuum to develop the discontinuous multilayer structure. The as-deposited and annealed multilayers show (111) texturin...
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ftinformaticsojs:oai:oai.informaticsjournals.com:article/1968 2023-05-15T16:01:53+02:00 Investigation of Co/Ag Discontinuous Multilayers Prepared by UHV Electron Beam Evaporation Sankaranarayanan, V. K. Prakash, Om Lakshmikumar, S. T. Basic Science 2015-07-15 application/pdf https://www.informaticsjournals.com/index.php/jsst/article/view/1968 https://doi.org/10.18311/jsst/2006/1968 eng eng Informatics Publishing Limited & Indian Society for Surface Science and Technology (ISSST) https://www.informaticsjournals.com/index.php/jsst/article/view/1968/1066 https://www.informaticsjournals.com/index.php/jsst/article/view/1968 doi:10.18311/jsst/2006/1968 Copyright (c) 1970 Journal of Surface Science and Technology Journal of Surface Science and Technology; Volume 22, Issue 1-2, 2006; 15-23 0976-9420 0970-1893 Chemistry Giant Magnetoresistance Co/Ag Multilayers Discontinuous Multilayers Magnetizations info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion Peer-reviewed Article 2015 ftinformaticsojs https://doi.org/10.18311/jsst/2006/1968 2022-07-27T14:20:39Z Co/Ag multilayers with 20 bilayers with the composition, Ti(5 nm) [Co(1 nm)/Ag(4 nm)]20 Ti(5 nm), were deposited by electron beam evaporation in ultrahigh vacuum and annealed under vacuum to develop the discontinuous multilayer structure. The as-deposited and annealed multilayers show (111) texturing with both Co and Ag (111) peaks in the XRD. The magnetization curves have ferromagnetic behaviour which gradually change on annealing above 200°C to show a reduction of squareness and an increase in coercivity, a reflection of the microstructural changes involving breaking of layers to form the so called discontinuous multilayer (DML) structure. Magnetoresistance curves show increase in MR value with annealing that attains a constant value above 300°C presumably due to stagnation in growth of Co grains which are surrounded by Ag atoms. Article in Journal/Newspaper DML Informatics Journals (Informatics Publishing Ltd.) |
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Open Polar |
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Informatics Journals (Informatics Publishing Ltd.) |
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ftinformaticsojs |
language |
English |
topic |
Chemistry Giant Magnetoresistance Co/Ag Multilayers Discontinuous Multilayers Magnetizations |
spellingShingle |
Chemistry Giant Magnetoresistance Co/Ag Multilayers Discontinuous Multilayers Magnetizations Sankaranarayanan, V. K. Prakash, Om Lakshmikumar, S. T. Investigation of Co/Ag Discontinuous Multilayers Prepared by UHV Electron Beam Evaporation |
topic_facet |
Chemistry Giant Magnetoresistance Co/Ag Multilayers Discontinuous Multilayers Magnetizations |
description |
Co/Ag multilayers with 20 bilayers with the composition, Ti(5 nm) [Co(1 nm)/Ag(4 nm)]20 Ti(5 nm), were deposited by electron beam evaporation in ultrahigh vacuum and annealed under vacuum to develop the discontinuous multilayer structure. The as-deposited and annealed multilayers show (111) texturing with both Co and Ag (111) peaks in the XRD. The magnetization curves have ferromagnetic behaviour which gradually change on annealing above 200°C to show a reduction of squareness and an increase in coercivity, a reflection of the microstructural changes involving breaking of layers to form the so called discontinuous multilayer (DML) structure. Magnetoresistance curves show increase in MR value with annealing that attains a constant value above 300°C presumably due to stagnation in growth of Co grains which are surrounded by Ag atoms. |
format |
Article in Journal/Newspaper |
author |
Sankaranarayanan, V. K. Prakash, Om Lakshmikumar, S. T. |
author_facet |
Sankaranarayanan, V. K. Prakash, Om Lakshmikumar, S. T. |
author_sort |
Sankaranarayanan, V. K. |
title |
Investigation of Co/Ag Discontinuous Multilayers Prepared by UHV Electron Beam Evaporation |
title_short |
Investigation of Co/Ag Discontinuous Multilayers Prepared by UHV Electron Beam Evaporation |
title_full |
Investigation of Co/Ag Discontinuous Multilayers Prepared by UHV Electron Beam Evaporation |
title_fullStr |
Investigation of Co/Ag Discontinuous Multilayers Prepared by UHV Electron Beam Evaporation |
title_full_unstemmed |
Investigation of Co/Ag Discontinuous Multilayers Prepared by UHV Electron Beam Evaporation |
title_sort |
investigation of co/ag discontinuous multilayers prepared by uhv electron beam evaporation |
publisher |
Informatics Publishing Limited & Indian Society for Surface Science and Technology (ISSST) |
publishDate |
2015 |
url |
https://www.informaticsjournals.com/index.php/jsst/article/view/1968 https://doi.org/10.18311/jsst/2006/1968 |
op_coverage |
Basic Science |
genre |
DML |
genre_facet |
DML |
op_source |
Journal of Surface Science and Technology; Volume 22, Issue 1-2, 2006; 15-23 0976-9420 0970-1893 |
op_relation |
https://www.informaticsjournals.com/index.php/jsst/article/view/1968/1066 https://www.informaticsjournals.com/index.php/jsst/article/view/1968 doi:10.18311/jsst/2006/1968 |
op_rights |
Copyright (c) 1970 Journal of Surface Science and Technology |
op_doi |
https://doi.org/10.18311/jsst/2006/1968 |
_version_ |
1766397569694433280 |