Fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition

Abstract The emerging need for flexible and wearable electronics has been pushing the edge of the traditional electroless deposition (ELD) technique. With the rapid development of polymer‐assisted ELD (PAELD), its time‐consuming and possess‐complicated procedures have hindered the application of the...

Full description

Bibliographic Details
Published in:Journal of Applied Polymer Science
Main Authors: Hu, Fenghuai, Zhao, Haili, Pan, Yunfei, Yang, Dasheng, Sha, Jin, Gao, Yang
Other Authors: National Key Research and Development Program of China, National Natural Science Foundation of China, Shanghai Rising-Star Program
Format: Article in Journal/Newspaper
Language:English
Published: Wiley 2020
Subjects:
DML
Online Access:http://dx.doi.org/10.1002/app.50249
https://onlinelibrary.wiley.com/doi/pdf/10.1002/app.50249
https://onlinelibrary.wiley.com/doi/full-xml/10.1002/app.50249
id crwiley:10.1002/app.50249
record_format openpolar
spelling crwiley:10.1002/app.50249 2024-06-02T08:05:48+00:00 Fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition Hu, Fenghuai Zhao, Haili Pan, Yunfei Yang, Dasheng Sha, Jin Gao, Yang National Key Research and Development Program of China National Natural Science Foundation of China Shanghai Rising-Star Program 2020 http://dx.doi.org/10.1002/app.50249 https://onlinelibrary.wiley.com/doi/pdf/10.1002/app.50249 https://onlinelibrary.wiley.com/doi/full-xml/10.1002/app.50249 en eng Wiley http://onlinelibrary.wiley.com/termsAndConditions#vor Journal of Applied Polymer Science volume 138, issue 16 ISSN 0021-8995 1097-4628 journal-article 2020 crwiley https://doi.org/10.1002/app.50249 2024-05-03T11:27:08Z Abstract The emerging need for flexible and wearable electronics has been pushing the edge of the traditional electroless deposition (ELD) technique. With the rapid development of polymer‐assisted ELD (PAELD), its time‐consuming and possess‐complicated procedures have hindered the application of the technique. Here, for purpose of addressing the challenge, the work demonstrates a highly efficient and versatile method, based on the procedure consisting of the customized polyelectrolyte brushes patterns fabrication with the assistance of mask‐free dynamic microprojection lithography and sequential selective ELD (DML‐ELD), for the fabrication of arbitrary electrode on the silicon dioxide/silicon (SiO 2 /Si) substrate. The resistivity of the patterned copper electrode maintained around 0.062 Ω∙mm at room temperature, indicating the high reproducibility and stability of the method. Furthermore, an interdigital copper electrode fabricated with the DML‐ELD method was coated with a poly(vinyl alcohol) sensing layer, forming a sandwich structure for the ambient humidity detection. The sensitivity of the lab‐made humidity sensor achieves 0.82 pF/%RH (<80%RH) and 19.3 pF/%RH (>80%RH). The work has demonstrated the broad prospect of the proposed DML‐ELD method in the rapid and customized manufacturing of microcircuit fabrication for electronic devices. Article in Journal/Newspaper DML Wiley Online Library Journal of Applied Polymer Science 138 16
institution Open Polar
collection Wiley Online Library
op_collection_id crwiley
language English
description Abstract The emerging need for flexible and wearable electronics has been pushing the edge of the traditional electroless deposition (ELD) technique. With the rapid development of polymer‐assisted ELD (PAELD), its time‐consuming and possess‐complicated procedures have hindered the application of the technique. Here, for purpose of addressing the challenge, the work demonstrates a highly efficient and versatile method, based on the procedure consisting of the customized polyelectrolyte brushes patterns fabrication with the assistance of mask‐free dynamic microprojection lithography and sequential selective ELD (DML‐ELD), for the fabrication of arbitrary electrode on the silicon dioxide/silicon (SiO 2 /Si) substrate. The resistivity of the patterned copper electrode maintained around 0.062 Ω∙mm at room temperature, indicating the high reproducibility and stability of the method. Furthermore, an interdigital copper electrode fabricated with the DML‐ELD method was coated with a poly(vinyl alcohol) sensing layer, forming a sandwich structure for the ambient humidity detection. The sensitivity of the lab‐made humidity sensor achieves 0.82 pF/%RH (<80%RH) and 19.3 pF/%RH (>80%RH). The work has demonstrated the broad prospect of the proposed DML‐ELD method in the rapid and customized manufacturing of microcircuit fabrication for electronic devices.
author2 National Key Research and Development Program of China
National Natural Science Foundation of China
Shanghai Rising-Star Program
format Article in Journal/Newspaper
author Hu, Fenghuai
Zhao, Haili
Pan, Yunfei
Yang, Dasheng
Sha, Jin
Gao, Yang
spellingShingle Hu, Fenghuai
Zhao, Haili
Pan, Yunfei
Yang, Dasheng
Sha, Jin
Gao, Yang
Fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition
author_facet Hu, Fenghuai
Zhao, Haili
Pan, Yunfei
Yang, Dasheng
Sha, Jin
Gao, Yang
author_sort Hu, Fenghuai
title Fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition
title_short Fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition
title_full Fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition
title_fullStr Fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition
title_full_unstemmed Fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition
title_sort fabricating patterned polyelectrolyte brushes by dynamic microprojection lithography for selective electroless metal deposition
publisher Wiley
publishDate 2020
url http://dx.doi.org/10.1002/app.50249
https://onlinelibrary.wiley.com/doi/pdf/10.1002/app.50249
https://onlinelibrary.wiley.com/doi/full-xml/10.1002/app.50249
genre DML
genre_facet DML
op_source Journal of Applied Polymer Science
volume 138, issue 16
ISSN 0021-8995 1097-4628
op_rights http://onlinelibrary.wiley.com/termsAndConditions#vor
op_doi https://doi.org/10.1002/app.50249
container_title Journal of Applied Polymer Science
container_volume 138
container_issue 16
_version_ 1800750674748637184